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Wide Functional Range thanks to Complex Semiconductor Technology

AEMtec is also regarded highly by users in the field of semiconductor manufacturing. For example, our continued progress in miniaturization permits ever higher data storage densities.

It is now possible to industrially manufacture structures with a spacing of 22 nanometres. The basis for this is ever greater precision, particularly in the field of lithography. In this high-precision process, mirror-reflected optical beams are used to write structures onto a photo-resist-layer via masks. An etching process transferred the tiny structures then from the open photo-resist structure to the material-coating layer underneath.

The outcoming dies can be used for the integration indifferent MOEMS. For this integration AEMtec provides services in cleanroom conidtions up to ISO class 5.



  • Lithography systems
  • Mask writers